Anodizing and plating system and method

ABSTRACT

An anodizing or plating system is provided that has a bath with an electrolytic solution into which a production part is at least partially disposed. For the anodizing process, an anodizing monitoring device is present and has a control panel at least partially disposed within the electrolytic solution. A power source for forming an electrical circuit between the power source, the bath, the production part, and the anodizing monitoring device is present. The production part and the anodizing monitoring device are arranged in parallel relationship to one another in the electrical circuit.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application claims the benefit of U.S. Provisional Application Ser.No. 61/218,495 filed on Jun. 19, 2009 and U.S. application Ser. No.12/803,072 filed on Jun. 18, 2011 in which both are incorporated byreference herein in its entirety for all purposes.

FIELD OF THE INVENTION

The present invention relates generally to a system and method foranodizing and plating. More particularly, the present applicationinvolves an anodizing and plating system and method that results in theformation of an accurate and even coating without the need to calculatethe area of the part being anodized.

BACKGROUND

It is known to provide surface treatments to metal parts during theirmanufacture in order to enhance their functionality or cosmeticappearance. For example, some properties of metal parts that may beimproved through application of surface treatments include hardness,corrosion resistance, color, wear, heat resistance, and electricalconductivity. Anodizing is an electrochemical process that is used totreat the surface of metal parts.

The anodizing process involves the provision of a reaction medium thatis an electrolytic solution. The solution used may be of various types.For example, the electrolytic solution utilized in anodizing processesmay be chromic acid, sulfuric acid, phosphoric acid, an organic acidsuch as sulfosalicylic acid, or a borate or tartrate bath. A voltagesource is provided and a cathode may be connected to its negativeterminal. The cathode is disposed within the electrolytic solution. Thecomponent to be treated is generally connected to the positive terminalof the voltage source and serves as the anode in the system. Thecomponent to be treated, which may be an aluminum part in variousanodizing processes, is likewise placed within the electrolyticsolution. Current may then be passed through the electrolytic solutionwhich may cause hydrogen to be released at the cathode and oxygen to bereleased at the anode. This causes a build up of aluminum oxide at thesurface of the aluminum part to be treated.

In order to create a coating with a desired thickness and/orconsistency, the amount of current applied is dependent upon the area ofthe component to be treated. For most anodizing applications, the amountof current per square decimeter of surface area is generally within therange of 0.3 to 3.0 amps. However, in order to anodize using constantcurrent the surface area of the treated part must be known. For complexgeometries this information may be difficult or time consuming toobtain. The operator may thus forego anodizing by constant currentdensity and instead use constant voltage as the requirement of surfacearea is not needed. However, the level of resistance to the passage ofelectrical current increases as the thickness of the generated oxideincreases. Anodizing via constant voltage will only be able to overcomea certain level of resistance thus causing a decay of the currentdensity as the amount of time increases. The current density decayincreases the amount of time needed to form an oxide of a desiredthickness on the treated component. Further, the use of constant voltagecauses the resulting oxide to be less consistent and causes a largervariance in thickness. Although anodizing through the use of constantcurrent density can achieve an improved resulting product versusanodizing by way of constant voltage, constant current density anodizingis often disfavored due to the requirement of knowing the surface areaof the component to be treated. As such, there remains room forvariation and improvement within the art.

BRIEF DESCRIPTION OF THE DRAWINGS

A full and enabling disclosure of the present invention, including thebest mode thereof, directed to one of ordinary skill in the art, is setforth more particularly in the remainder of the specification, whichmakes reference to the appended Figs. in which:

FIG. 1 is a schematic view of an anodizing system in accordance with oneexemplary embodiment.

FIG. 2 is a side view of an anodizing monitoring device in accordancewith one exemplary embodiment.

FIG. 3 is a front view of the anodizing monitoring device of FIG. 2.

FIG. 4 is a front view of a spacer in accordance with one exemplaryembodiment.

FIG. 5 is a side view of the spacer of FIG. 4.

FIG. 6 is a schematic view of a plating system in accordance with oneexemplary embodiment.

Repeat use of reference characters in the present specification anddrawings is intended to represent the same or analogous features orelements of the invention.

DETAILED DESCRIPTION OF REPRESENTATIVE EMBODIMENTS

Reference will now be made in detail to embodiments of the invention,one or more examples of which are illustrated in the drawings. Eachexample is provided by way of explanation of the invention, and notmeant as a limitation of the invention. For example, featuresillustrated or described as part of one embodiment can be used withanother embodiment to yield still a third embodiment. It is intendedthat the present invention include these and other modifications andvariations.

It is to be understood that the ranges mentioned herein include allranges located within the prescribed range. As such all ranges mentionedherein include all sub-ranges included in the mentioned ranges. Forinstance, a range from 100-200 also includes ranges from 110-150,170-190, and 153-162. Further, all limits mentioned herein include allother limits included in the mentioned limits. For instance, a limit ofup to 7 also includes a limit of up to 5, up to 3, and up to 4.5.

The present invention provides for an anodizing system 10 for use inanodizing production parts 26. The anodizing system 10 includes ananodizing monitoring device 30 that is arranged in parallel in anelectrical circuit with one or more production parts 26 to be anodized.The anodizing monitoring device 30 includes an amp meter 32 that may bemonitored by an operator. The operator may apply voltage to theelectrical circuit to cause anodizing of the production parts 26 andmonitor the amp meter 32 until a desired amount of amperage is achieved.Electrical energy may continue to be applied until a desired coating ofthe production parts 26 is reached. Constant current may thus be appliedin the anodizing process without the need to calculate the area of theproduction parts 26 being treated.

An anodizing system 10 in accordance with one exemplary embodiment isillustrated in FIG. 1. A bath 12 is provided that includes anelectrolytic solution 14. The electrolytic solution 14 may be any typeof substance used in anodizing processes. For example, the electrolyticsolution 14 may be chromic acid, sulfuric acid, phosphoric acid, orsulfosalicylic acid in accordance with various exemplary embodiments.The anodizing system 10 may also include an anode bar 16 and a cathode18 that together with a power source 28 and the electrolytic solution 14function to complete an electrical circuit. Implementation of theelectrical circuit may cause oxygen in the electrolytic solution 14 tobe removed and subsequently combined with material on the productionpart 26 to form an oxide coating. In accordance with certain exemplaryembodiments, the electrolytic solution 14 is sulfuric acid, and theproduction part 26 is aluminum in which the anodizing process forms analuminum oxide coating on the production part 26.

The anodizing system 10 may include a rack 20 that functions to holdproduction parts 26. The rack 20 includes a hook 22 that is used tosuspend the rack 20 from a bus bar 24 running above the bath 12. Theproduction parts 26 are anodized by the anodizing system 10 and are heldby the rack 20 so that they are immersed within the electrolyticsolution 14. In certain exemplary embodiments, the rack 20 may serve asthe anode bar 16 in the anodizing system 10. As a result, the rack 20 ismade of a material that is conductive enough to carry current sufficientfor performing anodizing. In these arrangements, the connection betweenthe rack 20 and the power source 28 may be located along a stem 21 ofthe rack 20 above and outside of the electrolytic solution 14. Further,the electrical connection may be at the hook 22 such that the powersource 28 extends through or at the bus bar 24. As at least a portion ofthe rack 20 is located within the electrolytic solution 14, an oxidelayer may likewise be formed on the rack 20 during anodizing. The oxidelayers formed on the production parts 26 and the rack 20 should both becompatible with the particular type of electrolytic solution 14 used sothat dissimilar metals are not present within the bath 12. The rack 20may be made of aluminum, titanium, tantalum or zirconium in accordancewith various exemplary embodiments.

Any number of production parts 26 may be mounted onto the rack 20. Forexample, the rack 20 may hold from 1-100 production parts 26 inaccordance with various exemplary embodiments. The production parts 26can be attached to the rack 20 through mechanical fasteners or may besecured thereon through a spring or frictional engagement. It is to beunderstood that the arrangement of the rack 20 shown in FIG. 1 is onlyexemplary and that racks 20 of other shapes, sizes and configurationscan be used in the anodizing system 10.

The anodizing system 10 includes a power source 28 that is connected toan anode bar 16. The anode bar 16 may be made of a variety of materialssuch as aluminum, titanium, copper, or combinations of these materialsin accordance with various exemplary embodiments. The anode bar 16 andthe bus bar 24 may be the same component in accordance with variousexemplary embodiments. In other arrangements, the anode bar 16 may be aseparate component from the bus bar 24.

The anodizing system 10 also includes a cathode 18 that forms a part ofthe electrical circuit. The cathode 18 may be made of aluminum,graphite, lead, stainless steel, or combinations of these materials inaccordance with various exemplary embodiments. The cathode 18 is shownas being attached to the side wall of the tank 13 of the bath 12 andlocated partially within the electrolytic solution 14. The power source28 is connected to the cathode 18 at a portion of the cathode 18 that iswithin the electrolytic solution 14. However, the electrical linephysically attaching the cathode 18 to the power source 28 may beattached at a location outside of the electrolytic solution 14 in otherarrangements. Although shown as being attached to the side wall of thetank 13, the cathode 18 need not be attached to the side wall of thetank 13 in other exemplary embodiments. In certain arrangements, thecathode 18 is the tank 13. Here, the power source 28 is connecteddirectly to the tank 13 and the tank 13 functions as the cathode 18 inthe electrical circuit. The anode bar 16 may serve as the positiveelectrode and the cathode 18 may serve as the negative electrode in theelectrical circuit. Voltage and current from the power source 28 maythus flow through the anode bar 16, the electrolytic solution 14, andthe cathode 18 and return to the power source 28. Passage of electricalenergy in the anodizing system 10 causes an oxide to be built upon theproduction part 26 due to the interaction of the electrical energy,electrolytic solution 14, and material making up the surface of theproduction part 26.

The anodizing system 10 features an anodizing monitoring device 30 thatis arranged in parallel with the production parts 26 that are beingmonitored. As such, the production parts 26 and the anodizing monitoringdevice 30 are in parallel relationship with respect to one another inthe electrical circuit making up the anodizing system 10. The productionparts 26 and the anodizing monitoring device 30 share the same voltagethat is output from the power source 28. Further, the current passedthrough the production parts 26 and the current passed through theanodizing monitoring device 30 add to the total current generated by thepower source 28. Additionally, the resistances imparted by theproduction parts 26 and the anodizing monitoring device 30 diminish toequal the total resistance. The anodizing monitoring device 30 may beplaced into parallel relationship with the production parts 26 by way ofconnection to the anode bar 16.

The anodizing monitoring device 30 may be made out of a variety ofmaterials in accordance with different exemplary embodiments. Forexample, the anodizing monitoring device 30 can include aluminum ortitanium. The portions of the spline 36 that are immersed within theelectrolytic solution 14 may be made completely out of aluminum ortitanium. Further, the entire spline 36 can be made out of aluminum ortitanium in other embodiments of the anodizing monitoring device 30. Thespline 36 can be adjustable so that its length may be capable of beingincreased or decreased for use with different sized tanks 13 and fordifferent levels of electrolytic solution 14 as desired. The surface ofthe spline 36 may be coated with PVC plastisol to prevent the spline 36from building an oxide layer during the anodizing process. One inch ofthe spline 36 extending down from the amp meter 32 need not be coatedwith PVC plastisol. Further, certain portions of the spline 36 locatedat the spacer 40 and the bolt 42 need not be coated with PVC plastisolas these areas may not be exposed during the anodizing process to theelectrolytic solution 14. The anodizing monitoring device 30 includesan, amp meter 32 that is capable of reading the current present in theanodizing monitoring device 30. The amp meter 32 may have a range of 0to 50 amps in accordance with one exemplary embodiment. The amp meter 32can be analog or digital in various embodiments of the anodizing system10 and may be located above the surface of the electrolytic solution 14.

A shunt 58 may be mounted in the amp meter 32 to allow the currentflowing through the anodizing monitoring device 30 to be read. In thisregard, the resistance of the shunt 58 is known and is generally verysmall so that the load on the electrical circuit will not be disrupted.The shunt 58 is placed in series with the load through the anodizingmonitoring device 30 so that all of the current to be measured by theshunt 58 will flow therethrough. The voltage drop across the shunt 58 isproportional to the current across the shunt 58 and the current can bemeasured as the resistance of the shunt 58 is a known value. Inaccordance with one exemplary embodiment, a voltmeter, such as amillivolt meter can be connected to the shunt 58 to read the voltagedrop across the shunt 58 and convert this value to the measured currentthrough the shunt 58 and hence through the anodizing monitoring device30.

A control panel 38 may be attached to the anodizing monitoring device 30and can be a material that is the same type of material as theproduction part 26 being anodized. In accordance with other exemplaryembodiments, the material making up the control panel 38 is not the sameas the material making up the production part 26 but is instead amaterial that has a similar anodizing response as that of the productionpart 26. For example, the production part 26 may be made of aluminum andthe control panel 38 may be an aluminum alloy in accordance with oneexemplary embodiment. The control panel 38 has an outer surface ontowhich an oxide is formed in the same way as the oxide formed on theproduction part 26 so that the control panel 38 and the production part26 exhibit a similar anodizing response. The control panel 38 may berectangular in shape and may have sides that are from 6 inches to 24inches in length in certain embodiments. In other embodiments the sidesof the control panel 38 may be up to 36 inches. In yet otherarrangements, the control panel 38 need not be rectangular or square inshape but may be variously shaped. In accordance with one exemplaryembodiment, the control panel 38 is 8.6 inches by 8.6 inches square andboth sides of the control panel 38 are exposed and have oxide coatedthereon during the anodizing process. The area of the control panel 38is thus easily measured by the operator so that the correct amount oftime at a particular current density can be calculated. Since thecontrol panel 38 is in series with the production parts 26 in theelectrical circuit, the same amount of oxide thickness will be impartedonto the production parts 26 as the control panel 38 during theanodizing process. The control panel 38 may provide 1 square foot ofarea so that the amount of amps illustrated on the amp meter 32 is ineffect is the amps per square foot or current density on the controlpanel 38. This amount may then be taken as the amount of currentimparted to the production parts 26. The control panel 38 may bereferred to as a control density monitoring panel in accordance withcertain exemplary embodiments.

FIGS. 2 and 3 illustrate the mounting of the control panel 38 to theanodizing monitoring device 30. A space 56 is present between thecontrol panel 38 and the spline 36 of the anodizing monitoring device30. The space 56 is sized so as to reflect the type of material makingup the rack 20 to which the production parts 26 are mounted. The space56 can be formed through the use of a spacer 40 that is located betweenthe control panel 38 and the spline 36. Apertures may be present in boththe spline 36 and the control panel 38 and these two parts may beattached to one another through use of a bolt 42 disposed through theapertures and fastened by use of a nut 44. Although attached, the spacer40 is located between the control panel 38 and spline 36 so that thecontrol panel 38 and spline 36 are attached to and spaced from oneanother. The spacer 40 may be made of aluminum when the production parts26 are aluminum and may be another material such as titanium or copperwhen these other materials are present on the rack 20. The space 56allows for the backside, and hence both sides, of the control panel 38to be anodized during the process as the backside of the control panel38 is not shielded from current if it were instead placed up against thespline 36. The size of the spacers 40 may be the same when differentmaterials are used such that a consistent space 56 is present whendifferent materials are anodized by the anodizing system 10.

The power source 28 may be activated so that a desired amount of ampsare measured at the amp meter 32. The user may know the desired amountof amps that the particular production parts 26 will take based uponexperience and rack 20 design. For example, a general guide is to use 30amps per square foot for all alloys except 2000 and 7000 series whichwill instead be 24 amps per square foot. The anodizing monitoring device30 is on the same electrical circuit as the production parts 26 and isin parallel relation thereto so that the current density at the ampmeter 32 that can be measured is the same current density that isapplied to the production parts 26. Again, the amp meter 32 measurescurrent but this value can be easily translated into current density asthe area of the control panel 38 is 1 square foot thus the amount ofamps measured at the amp meter 32 is also the amount of current densityin amps per square foot. The current and the current density may be thesame between the production parts 26 and the anodizing monitoring device30.

The control panel 38 may be mounted to the spline 36 before theanodizing monitoring device 30 is placed into the bath 12. In thisregard, the control panel 38 may be fully submersed within theelectrolytic solution 14. A portion of the spline 36 can be within theelectrolytic solution 14, and a portion of the spline 36 may be abovethe surface of the electrolytic solution 14. The amp meter 32 may belocated completely above the bath 12 so that no portion of the amp meter32 is submerged in certain embodiments. As shown, the amp meter 32 isconnected to the spline 36 by bolts 48 and 50. The anodizing monitoringdevice 30 may have a hook 34 that is attached to the spline 36 by way ofbolts 46 and 50. However, it is to be understood that the hook 34 neednot be a separate component but can be integrally formed with the spline36 in other arrangements. The hook 34 can be placed over the bus bar 24so that the anodizing monitoring device 30 can be properly located andplaced within the anodizing system 10. An insulator 60 may be presentbetween the hook 34 and the spline 36 to prevent or minimize heattransfer between these two components. Further, an optional insert 74can be located between the bus bar 24 and the hook 34 and will contactboth the bus bar 24 and the hook 34 when present. The insert 74 mayfunction to help stabilize the position of the device 30 on the bus bar24. However, it is to be understood that the insert 74 need not bepresent in other embodiments, and the hook 34 may be directly attachedto the bus bar 24 without any insert therebetween.

An operator that wishes to anodize production parts 26 using theanodizing system 10 may first select a control panel 38 that is made ofthe same or similar material as the production parts 26. A spacer 40 canbe selected based upon the type of rack 20 that is present in theanodizing system 10. For example, the rack 20 may be an aluminum rack 20and the spacer 40 may be designed particularly for use with aluminumracks 20 so that the correct amount of space 56 is realized.Alternatively, the rack 20 may be a titanium rack 20 and the operatorwill then select a different spacer 40 so that again the proper amountof space 56 is achieved. If not all ready done, the control panel 38 maybe cleaned and any protective coatings thereon are removed. The controlpanel 38 may be initially applied with a protective coating to preventcorrosion and scratches prior to use and this protective coating must beremoved and the surface generally cleaned with a solvent before use. Thespacer 40 can be located against the spline 36 and the operator maydispose the bolt 42 through the spacer 40 and through the centeraperture of the control panel 38. The bolt 42 may include titaniumthreads in one embodiment that are ½×13. The nut 44 can be placed ontothe bolt 42 and these components can be tightened to force the controlpanel 38 against the spacer 40 which is likewise pulled against thespline 36. Four holes may be disposed through the control panel 36 andmay have bolts placed therethrough and secured to the spline 36 in orderto assist in alignment of the control panel 38. In other versions, onlya single hole may be present, and in still other versions no holes usedfor alignment of the control panel 38 are present.

The rack 20 and the anodizing monitoring device 30 may then bepositioned into the anodizing system 10 so that the production parts 26and the control panel 38 are immersed within the electrolytic solution14. The hooks 22 and 34 can be placed onto the bus bar 24 so that therack 20 and anodizing monitoring device 30 are properly located.

The user may then apply electrical energy by way of the power source 28.Initially, the voltage of the power source 28 may be set to its maximumvalue and the current may be set to 0 amps. The normal maximum voltageof the power source 28 may be in the range of 75-100 volts in accordancewith different types of power sources 28. The power source 28 mayinclude a rectifier and it may be turned on to ramp-raise the amount ofcurrent supplied by the power source 28 to the electrical circuit. Thecurrent may be ramp-raised at a slow rate based on the particular alloyof the production part 26. Certain alloys may be more sensitive to theeffects of current passing therethrough and must have the currentgradually increased thereon in order to minimize or reduce theseeffects. The current may be ramp-raised until the amp meter 32 on theanodizing monitoring device 30 reaches the desired amount of amperage.

The process may be run for an amount of time necessary to reach adesired thickness of coating formed on the production parts 26 basedupon the 720 rule. The 720 rule may establish a good starting point thatcan be adjusted depending on the specific production parts 26 beingprocessed. The 720 rule is based on the fact that it may take somematerials 720 amp minutes per square foot to produce 1.0 mil of coating.However, this is not the case for 2xxx materials and certain castingalloys. The 720 rule works well for type II and type III coatings andmost wrought alloys. To determine the time necessary to treat theproduction parts, 720 is divided by the current density in amps persquare foot and this value produces 1.0 mil of coating. If 0.5 mil ofcoating is desired, the number obtained through dividing 720 by thecurrent density is multiplied by 0.5. Once the necessary amount of timeis calculated, the anodizing system 10 is run to the calculated amountof time and the amp meter 32 is checked to make sure the desired amountof constant amps are maintained. If the amount of amps is observed toincrease or decrease from the desired amount, the rectifier of the powersource 28 can be adjusted to correct for this variance. Althoughdescribed as using the 720 rule, it is to be understood that the amountof time needed to run the anodizing process may be calculated through adifferent method in accordance with other exemplary embodiments. Afterthe desired amount of time has expired, the power source 28 is shut downand the production parts 26 and the anodizing monitoring device 30 areremoved from the electrolytic solution 14. The thickness of the coatingformed on the production parts 26 may be verified. The control panel 38may be discarded. In alternative exemplary embodiments, the coatingformed on the control panel 38 may be removed and the control panel 38may be subsequently cleaned and reused in the anodizing system 10 in asubsequent process. Additionally, the rack 20 can be stripped of anycoating formed thereon through use in the anodizing system 10. Thecoating formed on the rack 20 may be removed through use of strippingsolutions and treatment. If the exposed material is titanium, thismaterial may not need to be stripped after processing.

If the control panel 38 is made from aluminum, the control panel 38 maybe discarded after processing or may be stripped and reused if desired.

In accordance with another exemplary embodiment of the anodizing system10, the anodizing monitoring device 30 includes a sending unit (notshown) that is configured to send a signal to a remote sensor (notshown) that may be in communication with the power source 28. Thissignal can be read and the rectifier of the power source 28 may becontrolled automatically in response thereto. Such an arrangement willeliminate the need of the operator to manually control the currentdensity. In other arrangements the signal is sent from the anodizingmonitoring device 30 to the power source 28 and the user may read theoutput at this location instead of having to look at the anodizingmonitoring device 30 that may be located in an inaccessible orinconvenient location.

The anodizing system 10 may thus control the rate of coating materialdeposited onto the production parts 26 through the use of current. Theresulting coating may be more accurate and even versus other anodizingsystems that employ constant voltage. Further, use of constant currentresults in faster deposition rates of the coating versus those makinguse of constant voltage. Removal of the need to calculate the area ofthe production parts 26 being processed may also result in a timesavings and hence a cost savings.

FIGS. 4 and 5 illustrate a spacer 40 in accordance with one exemplaryembodiment. The spacer 40 has a generally cylindrical shape with acentral aperture 72 located about a central axis that extends completelythrough the spacer 40. The central aperture 72 may be internallythreaded in order to receive external threading of the bolt 42 aspreviously discussed. A middle portion 62 of the spacer 40 has a largerouter diameter than two end portions 64 and 66 that are located onopposite sides of the middle portion 62 in the axial direction. AnO-ring 68 may surround end portion 64 so as to be located completelyaround the circumference of the end portion 64. The O-ring 68 may extendin the axial direction a lesser amount than the end portion 64. However,it is to be understood that the O-ring 68 can be variously sized inaccordance with other exemplary embodiments. An O-ring 70 may be locatedon the end portion 66 and can be arranged in a manner similar to O-ring68 that is associated with end portion 64. The spacer 40 can be placedagainst spline 36 so that end portion 64 is received within an apertureof spline 36. The O-ring 68 can be compressed between the middle portion62 and spline 36 and may be in contact with both of these components.The control density monitoring panel 38 may be placed over the endportion 66 so that the end portion 66 is at least partially disposedthrough an aperture of the control density monitoring panel 38. TheO-ring 70 will be compressed between the control density monitoringpanel 38 and the middle portion 62 and wilt contact both of theseelements. The O-rings 68 and 70 may prevent the electrolytic solution 14from contacting certain portions of the spacer 40, spline 36, andcontrol density monitoring panel 38 so that these certain portions arenot anodized during the process. A nut 44 and bolt 42 may be employed aspreviously discussed to connect and fasten the aforementioned partstogether and to provide force sufficient to compress the O-rings 68 and70 and effect sealing. The axial length of the middle portion 62corresponds to the space 56 so that the space 56 is equal to the axiallength of the middle portion 62.

Although described as being an anodizing system 10, it is to beunderstood that the system 10 may be a plating system 10 and may be usedin a plating process as well in accordance with other exemplaryembodiments. FIG. 6 illustrates one exemplary embodiment of the platingsystem 10. The plating process functions to deposit metal in theelectrolytic solution 14 onto the surface of the production parts 26.The spline 36 may be made of copper when the system 10 is configured asa plating system 10. The anodizing monitoring device 30 may be referredto as a plating monitoring device 30 when the plating process isperformed but it is to be understood that this is only for terms ofconvenience and the actual part may function in the same manner. Thepolarity of the system 10 may be changed when the system 10 isconfigured as a plating system 10 such that the bus bar 24 is thecathode 18 and the tank 13 of the bath 12 or another object in theelectrolytic solution 14 is the anode 16. The system 10 may be run in asimilar manner as previously discussed in order to perform the platingprocess.

While the present invention has been described in connection withcertain preferred embodiments, it is to be understood that the subjectmatter encompassed by way of the present invention is not to be limitedto those specific embodiments. On the contrary, it is intended for thesubject matter of the invention to include all alternatives,modifications and equivalents as can be included within the spirit andscope of the following claims.

What is claimed:
 1. An anodizing system, comprising: a bath that has atank and an electrolytic solution; a production part at least partiallydisposed within the electrolytic solution; an anodizing monitoringdevice having a control panel, wherein the control panel is at leastpartially disposed within the electrolytic solution; and a power sourcefor imparting electrical energy to form an electrical circuit thatincludes the electrolytic solution, the production part, and theanodizing monitoring device in order to anodize the production part. 2.The anodizing system as set forth in claim 1, where the production partand the anodizing monitoring device are arranged in parallelrelationship to one another in the electrical circuit.
 3. The anodizingsystem as set forth in claim 2, wherein the anodizing monitoring devicehas an amp meter for use in measuring the amount of amperage in theanodizing monitoring device when the power source causes the electricalcircuit to be formed.
 4. The anodizing system as set forth in claim 3,wherein the control panel has an area of one square foot that isanodized along with the production part during anodizing of theproduction part, wherein the amp meter measures the amount of currentthrough the anodizing monitoring device such that the output of the ampmeter in amps is also the amount of current density in amps per squarefoot, wherein the current and current density through the control panelare the same as the current and current density through the productionpart, and wherein the amp meter is monitored such that constant currentis applied during anodizing of the production part without the need tocalculate the surface area of the production part.
 5. The anodizingsystem as set forth in claim 1, wherein the control panel is made of amaterial that has a similar anodizing response as that of the productionpart.
 6. The anodizing system as set forth in claim 5, wherein thecontrol panel is made of the same material as the production part. 7.The anodizing system as set forth in claim 1, further comprising: ananode bar that is part of the electrical circuit and that is inelectrical communication with a stem of the anodizing monitoring device,wherein at least a portion of the stem of the anodizing monitoringdevice is coated with polyvinyl chloride plastisol; and a rack that hasa stem that is part of the electrical circuit, wherein the productionpart is carried by the rack, and wherein the stem of the rack is inelectrical communication with the anode bar.
 8. The anodizing system asset forth in claim 1, wherein a cathode that serves as a negativeelectrode of the electrical circuit is part of the electrical circuitand is attached to an inner surface of the tank of the bath and is atleast partially submerged in the electrolytic solution.
 9. The anodizingsystem as set forth in claim 1, wherein the anodizing monitoring devicehas a stern, and further comprising a spacer that is positioned betweenthe stem and the control panel such that the control panel is spacedfrom the stem and does not contact the stem.
 10. The anodizing system asset forth in claim 9, further comprising a rack that forms part of theelectrical circuit and that carries the production part, wherein thespacer, the production part, and the control panel are made of the samematerial, and wherein the spacer is selected based upon the type of rackthat is present.
 11. The anodizing system as set forth in claim 9,wherein the spacer defines a central aperture therethrough that receivesa bolt used for effecting attachment of the control panel and spacer tothe stem, wherein the spacer has a first O-ring that engages a first endportion of the spacer, and wherein the spacer has a second O-ring thatengages a second end portion of the spacer, and wherein a middle portionof the spacer has an axial length that is equal to the distance thecontrol panel is, spaced from the stem.
 12. An anodizing system,comprising: a bath that has a tank and an electrolytic solution; aproduction part disposed within the electrolytic solution; an anodizingmonitoring device having a control panel, wherein the control panel isdisposed within the electrolytic solution and is made of a material thathas a similar anodizing response as that of the production part, whereinthe anodizing monitoring device has an amp meter and a stem, wherein theamp meter is capable of measuring the amount of current through theanodizing monitoring device, wherein a portion of the stem is locatedoutside of the electrolytic solution; a rack that is at least partiallylocated within the electrolytic solution, wherein the rack has a stemthat is at least partially located outside of the electrolytic solution,wherein the rack carries the production part; an anode bar in electricalcommunication with the rack and the anodizing monitoring device; and apower source for imparting electrical energy to form an electricalcircuit that includes the anode bar, the electrolytic solution, theproduction part, the rack and the anodizing monitoring device, whereinconstant current is applied by the power source in order to anodize theproduction part, wherein the production part and the anodizingmonitoring device are arranged in parallel relationship to one anotherin the electrical circuit.
 13. The anodizing system as set forth inclaim 12, wherein the control panel is made of the same material as theproduction part.
 14. The anodizing system as set forth in claim 12,wherein the stem of the rack has a hook on a terminal end that is hookedonto the anode bar, wherein the anodizing monitoring device has a hookthat is in electrical communication with the stem of the anodizingmonitoring device and is hooked onto the anode bar, and wherein thecontrol panel has an area of one square foot that is anodized along withthe production part during anodizing of the production part, wherein theamp meter measures the amount of current through the anodizingmonitoring device such that the output of the amp meter in amps is alsothe amount of current density in amps per square foot, wherein thecurrent and current density through the control panel are the same asthe current and current density through the production part, and whereinthe amp meter is monitored such that constant current is applied duringanodizing of the production part without the need to calculate thesurface area of the production part.
 15. The anodizing system as setforth in claim 12, wherein a cathode that serves as a negative electrodeof the electrical circuit is part of the electrical circuit and isattached to an inner surface of the tank of the bath and is submerged inthe electrolytic solution.
 16. The anodizing system as set forth inclaim 12, wherein: the anodizing monitoring device has a spacer that ispositioned between the stem of the anodizing monitoring device and thecontrol panel such that the control panel is spaced from and does notcontact the stem of the anodizing monitoring device, wherein the spaceris selected based upon the type of rack that is present and is made ofthe same material as the control panel; and wherein the spacer defines acentral aperture therethrough that receives a bolt used for effectingattachment of the control panel and spacer to the stern of the anodizingmonitoring device, wherein the spacer has a first O-ring that engages afirst end portion of the spacer, and wherein the spacer has a secondO-ring that engages a second end portion of the spacer, and wherein amiddle portion of the spacer has an axial length that is equal to thedistance the control panel is spaced from the stem of the anodizingmonitoring device.
 17. A plating system, comprising: a bath that has atank and an electrolytic solution; a production part at least partiallydisposed within the electrolytic solution; a plating monitoring devicehaving a control panel, wherein the control panel is at least partiallydisposed within the electrolytic solution; and a power source forimparting electrical energy to form an electrical circuit that includesthe electrolytic solution, the production part, and the platingmonitoring device in order to plate the production part.
 18. The platingsystem as set forth in claim 17, wherein the production part and theplating monitoring device are arranged in parallel relationship to oneanother in the electrical circuit.
 19. The plating system as set forthin claim 18, further comprising: a cathode bar that is part of theelectrical circuit and that is in electrical communication with a stemof the plating monitoring device, wherein the cathode bar serves as anegative electrode of the electrical circuit; a rack that has a stemthat is part of the electrical circuit, wherein the production part iscarried by the rack, and wherein the stem of the rack is in electricalcommunication with the cathode bar; and an anode that serves as apositive electrode of the electrical circuit and that is part of theelectrical circuit, wherein the anode is attached to an inner surface ofthe tank of the bath and is at least partially submerged in theelectrolytic solution.
 20. The plating system as set forth in claim 19,wherein the control panel has an area of one square foot that is platedalong with the production part during plating of the production part,wherein the amp meter measures the amount of current through the platingmonitoring device such that the output, of the amp meter in amps is alsothe amount of current density in amps per square foot, wherein thecurrent and current density through the control panel are the same asthe current and current density through the production part, and whereinthe amp meter is monitored such that constant current is applied duringplating of the production part without the need to calculate the surfacearea of the production part; wherein the plating monitoring device has aspacer that is positioned between a stem of the plating monitoringdevice and the control panel such that the control panel is spaced fromand does not contact the stem of the plating monitoring device, whereinthe spacer is selected based upon the type of rack that is present andis made of the same material as the control panel; and wherein thespacer defines a central aperture therethrough that receives a bolt usedfor effecting attachment of the control panel and spacer to the stem ofthe plating monitoring device, wherein the spacer has a first O-ringthat engages a first end portion of the spacer, and wherein the spacerhas a second O-ring that engages a second end portion of the spacer, andwherein a middle portion of the spacer has an axial length that is equalto the distance the control panel is spaced from the stem of the platingmonitoring device.